| 发明名称 | Surface-tensioned sapphire plate | ||
| 摘要 | A surface-tensioned sapphire plate and a corresponding manufacturing process. The plate may include a planar sapphire substrate and at least one layer disposed on the surface of the substrate for tensing the substrate. The layer may include at least 50 wt.-% of aluminum oxide (Al2O3). The manufacturing process for producing of a sapphire plate may include providing a planar sapphire substrate, and coating at least one surface of the substrate with a layer tensing the substrate. The layer may include at least 50 wt.-% of aluminum oxide (Al2O3). | ||
| 申请公布号 | US9617639(B2) | 申请公布日期 | 2017.04.11 |
| 申请号 | US201414453065 | 申请日期 | 2014.08.06 |
| 申请人 | APPLE INC. | 发明人 | Beckmann Rudolf;Kress Markus |
| 分类号 | C23C16/513;C23C14/34;C23C14/58;C03C17/245;C30B29/20;C23C14/08;C23C16/40 | 主分类号 | C23C16/513 |
| 代理机构 | Brownstein Hyatt Farber Schreck, LLP | 代理人 | Brownstein Hyatt Farber Schreck, LLP |
| 主权项 | 1. A surface-tensioned sapphire plate comprising: a planar sapphire substrate; at least one layer disposed on the surface of the substrate and exhibiting a residual tensile stress; wherein the layer has at least 50 wt.-% of aluminum oxide (Al2O3). | ||
| 地址 | Cupertino CA US | ||