发明名称 Curable resin composition, production method of image sensor chip using the same, and image sensor chip
摘要 There is provided a curable resin composition which is capable of being coated on a solid-state imaging device substrate and contains a dye having a maximum absorption wavelength in a wavelength range from 600 to 850 nm, a production method of image sensor chip comprising a step of coating the curable resin composition on a solid-state imaging device substrate to form a dye-containing layer, and a step of adhering a glass substrate having an infrared ray reflecting film onto the dye-containing layer, and an image sensor chip comprising a solid-state imaging device substrate and a dye-containing layer composed of the curable resin composition.
申请公布号 US9620542(B2) 申请公布日期 2017.04.11
申请号 US201514725172 申请日期 2015.05.29
申请人 FUJIFILM Corporation 发明人 Ezoe Toshihide;Shimada Kazuto
分类号 H01L31/0232;H01L27/146;C09D7/12;C09D201/00;C08L101/00;H04N5/225;H04N5/335;G02B5/22 主分类号 H01L31/0232
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An image sensor chip comprising a solid-state imaging device substrate, a dye-containing layer composed of a curable resin composition and a glass substrate having an infrared ray reflecting film, wherein: these members are closely contacted with each other without intervention of an air layer; the infrared ray reflecting film is provided between the dye-containing layer composed of the curable resin composition and the glass substrate; and the curable resin composition is a curable resin composition which is capable of being coated on a solid-state imaging device substrate and contains a dye having a maximum absorption wavelength in a wavelength range from 600 to 850 nm.
地址 Tokyo JP