Optical patterning mask and method for fabricating display device using the same

摘要

The optical patterning mask had a protection layer on a light absorption layer. It prevents the light absorption layer from damaged by the cleaning gas when processing the used optical patterning mask for reuse. The protection layer may be made of the same material as bank layer or of material different from the bank layer. The bank layer defines the boundary of the area to be transferred in the transfer layer. The protection layer of the present invention can maintain longer the transfer efficiency of the optical patterning mask, even when the same mask is used repeatedly after cleaning, since the light absorption layer protected from cleaning process can maintain longer its heat conversion property.

主权项

1. An optical patterning mask, comprising:
a base substrate; a reflective layer disposed on the base substrate and including an opening; a thermal insulation layer disposed on the reflective layer to cover the opening; a light absorption layer disposed on the thermal insulation layer; a tapered layer arranged between the thermal insulation layer and the light absorption layer; a protection layer disposed on the light absorption layer to overlap the opening; a bank layer disposed on the light absorption layer to expose the protection layer; and a transfer layer disposed on the protection layer and the bank layer, wherein the protection layer is thinner than the bank layer, wherein the transfer layer comprises a transfer inclination portion having an inclination in a portion that overlaps an edge of the opening, and wherein the tapered layer includes a tapered inclination portion formed to expose a portion of the thermal insulation layer overlapping the opening.