发明名称 |
Semiconductor physical quantity sensor |
摘要 |
A semiconductor physical quantity sensor includes: a first base material; an electrode formed on the first base material; a diaphragm which bends in accordance with a physical quantity applied from the outside; a second base material fixed to the first base material and supporting the diaphragm such that the diaphragm is opposed to the electrode with a space (S) in between; and an insulator formed on a surface on the first base material side of the diaphragm. Moreover, a wall portion to define the space (S) is formed between the insulator and the electrode. |
申请公布号 |
US9618412(B2) |
申请公布日期 |
2017.04.11 |
申请号 |
US201414913158 |
申请日期 |
2014.08.08 |
申请人 |
Panasonic Intellectual Property Management Co., Ltd. |
发明人 |
Kataoka Kazushi;Ogihara Jun;Ushiyama Naoki;Shiroishi Hisanori |
分类号 |
G01L9/00;B81B7/00;B81B3/00 |
主分类号 |
G01L9/00 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A semiconductor physical quantity sensor comprising:
a first base material; an electrode formed on the first base material; a diaphragm configured to bend in accordance with a physical quantity applied from the outside; a second base material fixed to the first base material and supporting the diaphragm such that the diaphragm is opposed to the electrode with a space in between; an insulator formed on a surface of the diaphragm, the surface being on the first base material side; a through-hole penetrating the second base material to detect a capacitance between the diaphragm and the electrode, and a wall portion to surround at least part of the through-hole and define the space and the through-hole, wherein the wall portion is formed in a gap between the insulator and the electrode facing each other in a thickness direction of the diaphragm. |
地址 |
Osaka JP |