发明名称 BATTERY PROTECTION PACKAGE AND PROCESS OF MAKING THE SAME
摘要 The present invention discloses small-size battery protection packages and provides a process of fabricating small-size battery protection packages. A battery protection package includes a first common-drain metal oxide semiconductor field effect transistor (MOSFET), a second common-drain MOSFET, a power control integrated circuit (IC), a plurality of solder balls, a plurality of conductive bumps, and a packaging layer. The power control IC is vertically stacked on top of the first and second common-drain MOSFETs. At least a majority portion of the power control IC and at least majority portions of the plurality of solder balls are embedded into the packaging layer. The process of fabricating battery protection packages includes steps of fabricating power control ICs; fabricating common-drain MOSFET wafer; integrating the power control ICs with the common-drain MOSFET wafer and connecting pinouts; forming a packaging layer; applying grinding processes; forming a metal layer; and singulating battery protection packages.
申请公布号 US2017098626(A1) 申请公布日期 2017.04.06
申请号 US201615387630 申请日期 2016.12.21
申请人 Alpha and Omega Semiconductor Incorporated 发明人 Niu Zhiqiang;Xue Yan Xun;Hu Man Sheng;Lu Jun;Ho Yueh-Se;Yilmaz Hamza
分类号 H01L25/065;H01L21/304;H01L21/78;H01L21/56;H02J7/00;H01L23/31;H01L23/544;H01L21/66;H01L21/48;H01L23/495;H01L23/00;H01L25/00 主分类号 H01L25/065
代理机构 代理人
主权项 1. A process for fabricating battery protection packages, the process comprising the steps of: fabricating power control integrated circuits (ICs), the step of fabricating power control ICs comprising the sub-steps of: providing a power control IC wafer having a first surface and a second surface opposing the first surface of the power control IC;forming conductive bumps on the first surface of the power control IC wafer;thinning the power control IC wafer by grinding at the second surface of the power control IC wafer; andsingulating the power control ICs from the power control IC wafer; fabricating common-drain metal oxide semiconductor field effect transistors (MOSFETs), the step of fabricating common-drain MOSFETs comprising the sub-steps of: providing a common-drain MOSFET wafer having a first surface and a second surface opposing the first surface of the common-drain MOSFET wafer;forming a first passivation layer on the first surface of the common-drain MOSFET wafer;removing part of the passivation layer so as to expose metal lines; andforming a second passivation layer; integrating the power control ICs with the common-drain MOSFET wafer and connecting pinouts so as to form an interconnected wafer; forming a packaging layer on the interconnected wafer, the packaging layer having a first surface; grinding at the first surface of the packaging layer; grinding at the second surface of the common-drain MOSFET wafer; depositing a metal layer on the ground second surface of the common-drain MOSFET wafer so as to form a processed interconnected wafer; and singulating the battery protection packages from the processed interconnected wafer.
地址 Sunnyvale CA US