METHODS OF CLEANING SURFACES OF PHOTOMASKS

摘要

A surface cleaning method includes forming a mask layer on a substrate, performing a first surface treatment process for scanning a surface of the mask layer with a first laser beam to stabilize the mask layer, patterning the mask layer to form a mask pattern, and performing a second surface treatment process for scanning surfaces of the mask pattern and the substrate with a second laser beam to remove contaminants on the mask pattern or the substrate.

主权项

1. A surface cleaning method comprising:
forming a mask layer over a substrate; applying a first surface treatment to a surface of the mask layer using a first laser to stabilize the mask layer and the substrate; forming a mask pattern by patterning the mask layer; and applying a second surface treatment to surfaces of the mask pattern and the substrate using a second laser to remove contaminants over the mask pattern or the substrate.