SUBSTRATE PROCESSING APPARATUS

摘要

A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, a processing liquid supply part for supplying a processing liquid onto the substrate, a cup part for receiving the processing liquid spattering from the substrate being rotated, by its inner peripheral surface, a top plate disposed above the substrate, and a liquid film forming part for forming a rotating liquid film which rotates in the same direction as the substrate does, on the inner peripheral surface of the cup part, by supplying a liquid onto an upper surface of the top plate rotating in the same direction as the substrate rotates, in parallel with a processing of the substrate with the processing liquid. It is possible to prevent droplets caused by collision of the processing liquid spattering from the substrate against the cup part from being deposited on the substrate.

主权项

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate in a horizontal state; a substrate rotating mechanism for rotating said substrate holding part together with said substrate about a central axis oriented in a vertical direction; a processing liquid supply part for supplying a processing liquid onto said substrate; a cup part disposed around said substrate holding part, for receiving said processing liquid spattering from said substrate being rotated, by its inner peripheral surface; a plate having an annular disk-like shape about said central axis, disposed above said substrate, extending toward the outside of an outer peripheral edge of said substrate in a radial direction about said central axis; and a liquid film forming part for forming a rotating liquid film which rotates in the same direction as said substrate does, on said inner peripheral surface of said cup part, by supplying a liquid onto an upper surface of said plate rotating in the same direction as said substrate rotates about said central axis, to thereby supply said liquid from said upper surface of said plate to said inner peripheral surface of said cup part by centrifugal force, in parallel with a processing of said substrate with said processing liquid.