CREATING A MINI ENVIRONMENT FOR GAS ANALYSIS

摘要

Systems and methods for in-situ leak detection and endpoint detection of wafer dry etch or chamber clean in chambers, e.g., vacuum chambers used in semiconductor processing. A mini environment is created and a sensor, such as an SPOES sensor, can be used in the mini-environment to perform leak detection.

主权项

1. A vacuum system, comprising:
a process chamber; a foreline coupled to the process chamber; a sensor manifold coupled to the foreline; a sensor coupled to the sensor manifold; and an assistant gas supply line coupled to the sensor manifold, wherein the foreline is configured to flow a testing sample from the process chamber into the sensor manifold and the assistant gas supply line is configured to flow an assistant gas into the sensor manifold, and wherein the testing sample and the assistant gas form a mini environment in the sensor manifold.