发明名称 METHOD AND APPARATUS FOR REDUCING IN-PROCESS AND IN-USE STICTION FOR MEMS DEVICES
摘要 The present disclosure involves forming a method of fabricating a Micro-Electro-Mechanical System (MEMS) device. A plurality of openings is formed in a first side of a first substrate. A dielectric layer is formed over the first side of the substrate. A plurality of segments of the dielectric layer fills the openings. The first side of the first substrate is bonded to a second substrate that contains a cavity. The bonding is performed such that the segments of the dielectric layer are disposed over the cavity. A portion of the first substrate disposed over the cavity is transformed into a plurality of movable components of a MEMS device. The movable components are in physical contact with the dielectric the layer. Thereafter, a portion of the dielectric layer is removed without using liquid chemicals.
申请公布号 US2017096328(A1) 申请公布日期 2017.04.06
申请号 US201514873243 申请日期 2015.10.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Tseng Lee-Chuan;Wu Chang-Ming;Liu Shih-Chang;Hsieh Yuan-Chih
分类号 B81B3/00;B81C1/00 主分类号 B81B3/00
代理机构 代理人
主权项 1. A method of fabricating a Micro-Electro-Mechanical System (MEMS) device, comprising: forming a layer on a first side of a first substrate, wherein the layer includes a plurality of protruding segments that are embedded in the first substrate; bonding the first substrate to a second substrate that contains a cavity, wherein the layer is disposed between the first substrate and the second substrate and over the cavity after the bonding; and etching a second side of the first substrate to form a plurality of movable components of a MEMS device, the second side being opposite the first side, wherein the movable components of the MEMS device are attached to the layer.
地址 Hsin-Chu TW
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