METHOD OF MANUFACTURING ELEMENT CHIP AND METHOD OF MANUFACTURING ELECTRONIC COMPONENT-MOUNTED STRUCTURE

摘要

In a method of manufacturing an element chip for manufacturing a plurality of element chips by dividing a substrate, where the protruding portions, which are exposed element electrodes, are formed on element regions, protection films made of fluorocarbon film are formed on a second surface and side surfaces of the element chip, and a first surface in a gap by exposing the element chip to second plasma after the substrate is divided by etching. Next, the protection films formed on the second surface and the side surfaces of the element chip are removed while leaving at least a part of the protection film formed in the gap by exposing the element chip to third plasma. Therefore, creep-up of a conductive material in a mounting step is suppressed by the left protection film.

主权项

1. A method of manufacturing an element chip, in which a plurality of element chips are manufactured by dividing a substrate, which includes a first surface having a plurality of element regions defined by dividing regions, a second surface on a side opposite to the first surface, and protruding portions which are exposed element electrodes, the protruding portions formed on the element regions using the dividing regions as boundaries, the method comprising:
a preparing step of preparing the substrate in which the first surface side of the substrate is supported on a carrier and on which an etching-resistant layer is formed on the second surface so as to cover regions of the second surface opposite to the element regions and to expose regions of the second surface opposite to the dividing regions in a state where gaps are formed between the first surface and the carrier with the protruding portions being in contact with the carrier; and a plasma processing step of performing plasma processing on the substrate that is supported on the carrier, after the preparing step, wherein the plasma processing step includes a dividing step of dividing the substrate into the element chips by etching regions of the substrate which are not covered by the etching-resistant layer in a depth direction of the substrate up to the first surface by exposing the second surface to first plasma, and causing the element chips each including the first surface, the second surface, and a side surface connecting the first surface and the second surface to be in a state of being held on the carrier with a space between each other, a protection film forming step of forming a protection film on the second surface of the element chip, the side surface of the element chip, and the first surface in the gap by exposing the element chips to second plasma generated by supplying protection film forming gas in a state where the element chip is held on the carrier with a space between each other after the dividing step, and a protection film removing step of removing the protection film, which is formed on the second surface and the side surface of the element chip, while leaving at least a part of the protection film formed in the gap by exposing the element chip to third plasma generated by supplying protection film etching gas in a state where the element chips are held on the carrier with a space between each other after the protection film forming step.