Vapor deposition apparatus and method

摘要

A vapor deposition apparatus (100) for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit (105) configured to receive a first source gas, a reaction space (103) connected to the supply unit (105), a plasma generator (111) in the reaction space (103), a first injection unit (142) configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit (142) in the reaction space (103), the filament unit (142) being connected to a power source.