METHOD AND INSTALLATION FOR PRODUCING METALLISED SEMICONDUCTOR SUBSTRATES

摘要

The invention relates to a method for producing metallised semiconductor substrates, in which a substrate is immersed in a coating bath, where it is coated in a preferably light-induced or light-assisted manner. The coated substrate is then transferred to a rinsing device for removing metal residue from the electrolyte. In the rinsing device, the substrate is subjected to a cascade rinsing process. Metal-containing rinsing medium that accrues during the rinsing process is at least partially fed back into the coating bath. The invention further relates to an installation for carrying out such a method.