发明名称 Reduced-warpage laminate structure
摘要 A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
申请公布号 US9613915(B2) 申请公布日期 2017.04.04
申请号 US201414557795 申请日期 2014.12.02
申请人 International Business Machines Corporation 发明人 Lamorey Mark C.;Li Shidong;Patel Janak G.;Powell Douglas O.;Russell David J.;Slota, Jr. Peter;Stone David B.
分类号 H01L23/00;H01L23/498;H01L21/48;H05K3/10;H05K1/02 主分类号 H01L23/00
代理机构 代理人 Kelly L. Jeffrey
主权项 1. A structure comprising: a first conductive layer above and in direct contact with a dielectric layer, wherein the first conductive layer comprises functional conductive copper wiring and additional supplemental copper, and wherein the additional supplemental copper is configured to counter a first differential stress of the first conductive layer caused by the functional conductive copper wiring, wherein the first conductive layer has a planar, rectangular shape, wherein the additional supplemental copper has a square shape that is positioned at each corner of the conductive layer, wherein the additional supplemental copper has a rectangular shape that is positioned at the periphery at each side of the conductive layer; and a second conductive layer below and in direct contact with the dielectric layer, the dielectric layer is selectively configured only in corresponding regions of the first conductive layer and the second conductive layer to balance a second differential stress caused by a localized difference in copper density between the first conductive layer and the second conductive layer, wherein the dielectric layer comprises a high-modulus dielectric material that mechanically reinforces the structure and reduces warpage.
地址 Armonk NY US