Wire grid polarizer and method of fabricating the same

摘要

A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.

主权项

1. A method of fabricating a wire grid polarizer, the method comprising:
sequentially forming a conductive layer on a substrate, a guide layer on the conductive layer, and a surface treatment protection layer on the guide layer; patterning the surface treatment protection layer and the guide layer to form a first pattern in which a first surface treatment protection pattern is formed on a first guide pattern that partially exposes the conductive layer, and a second pattern in which a second surface treatment protection pattern is formed on a second guide pattern; forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns; removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns; and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.