Exposure dose homogenization through rotation, translation, and variable processing conditions

摘要

A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.

主权项

1. A method of treating a substrate, comprising:
disposing the substrate on a substrate support in a flood exposure treatment system; selecting a flood exposure dose profile; and exposing the substrate to flood irradiation from a source, terminating the flood irradiation when the selected flood exposure dose profile is achieved, wherein exposing the substrate to flood irradiation comprises controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.