发明名称 |
Method for fabricating display device and display device |
摘要 |
A method for fabricating a display device includes forming a thin film transistor on a base substrate, forming a first electrode connected to the thin film transistor, forming a pixel defining layer overlapping a portion of the first electrode, such that the pixel defining layer exposes a portion of the first electrode and partitions pixel areas, forming a block copolymer layer on the first electrode and the pixel defining layer, patterning the block copolymer layer, etching the pixel defining layer by using the patterned block copolymer layer as a mask, such that an uneven pixel defining layer with a plurality of defining layer grooves is formed, and forming a light emitting layer on the first electrode and the uneven pixel defining layer. |
申请公布号 |
US9614015(B2) |
申请公布日期 |
2017.04.04 |
申请号 |
US201514704002 |
申请日期 |
2015.05.05 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Park Seungwon;Lee Baek Hee;Choi Manseob;Kang Minhyuck;Lee Moongyu |
分类号 |
H01L29/18;H01L27/32;H01L51/52;G03F7/004 |
主分类号 |
H01L29/18 |
代理机构 |
Lee & Morse, P.C. |
代理人 |
Lee & Morse, P.C. |
主权项 |
1. A method for fabricating a display device, the method comprising:
forming a thin film transistor on a base substrate; forming a first electrode connected to the thin film transistor; forming a pixel defining layer overlapping a portion of the first electrode, such that the pixel defining layer exposes a portion of the first electrode and partitions pixel areas; forming a block copolymer layer on the first electrode and the pixel defining layer; patterning the block copolymer layer; etching the pixel defining layer by using the patterned block copolymer layer as a mask, such that an uneven pixel defining layer with a plurality of defining layer grooves is formed; and forming a light emitting layer on the first electrode and the uneven pixel defining layer. |
地址 |
Yongin, Gyeonggi-do KR |