发明名称 NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE
摘要 A nitride-based semiconductor light-emitting device comprises a light-emitting stack comprising a first semiconductor structure having a first conductivity, a second semiconductor structure having a second conductivity, and an active region between the first semiconductor structure and the second semiconductor structure; a semiconductor buffer structure formed under the first semiconductor structure; an un-doped AlGaN layer formed between the first semiconductor structure and the semiconductor buffer structure; and a substrate under the semiconductor buffer structure, wherein the semiconductor buffer structure comprises an un-doped first layer under the un-doped AlGaN layer, and an un-doped second layer between the un-doped first layer and the substrate, and wherein the thickness of the un-doped first layer is thicker than that of the un-doped second layer and the un-doped AlGaN layer.
申请公布号 US2017092806(A1) 申请公布日期 2017.03.30
申请号 US201615373073 申请日期 2016.12.08
申请人 EPISTAR CORPORATION 发明人 LIN Wen Hsiang;HSIEH Chang-Hua
分类号 H01L33/06;H01L33/12;H01L33/32;H01L33/00 主分类号 H01L33/06
代理机构 代理人
主权项 1. A nitride-based semiconductor light-emitting device, comprising: a light-emitting stack comprising a first semiconductor structure having a first conductivity, a second semiconductor structure having a second conductivity, and an active region between the first semiconductor structure and the second semiconductor structure; a semiconductor buffer structure formed under the first semiconductor structure; an un-doped AlGaN layer formed between the first semiconductor structure and the semiconductor buffer structure; and a substrate under the semiconductor buffer structure, wherein the semiconductor buffer structure comprises an un-doped first layer under the un-doped AlGaN layer, and an un-doped second layer between the un-doped first layer and the substrate, and wherein the thickness of the un-doped first layer is thicker than that of the un-doped second layer and the un-doped AlGaN layer.
地址 Hsinchu City TW