MECHANICAL ISOLATION CONTROL FOR AN EXTREME ULTRAVIOLET (EUV) PELLICLE

摘要

Systems and methods for isolating a membrane during fabrication. The membrane is connected to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams. The magnet stack beams provide a gap between the wafer and the membrane. The wafer connected to the membrane by the magnet stack beams is received by a substrate holder so that a space is present between the membrane and the substrate holder. The membrane is rinsed by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.

主权项

1. A membrane holder, comprising:
a substrate wafer; a plurality of magnets of uniform dimensions formed into two or more magnet stack beams for connecting a membrane to the wafer, the magnet stack beams providing a gap between the wafer and the membrane when the membrane is connected; and a substrate holder configured to receive the wafer, wherein the magnet stack beams are positioned on the wafer so that a space is present between the membrane and the substrate holder when the membrane is connected for rinsing.