SEMICONDUCTOR-SUBSTRATE PROCESSING APPARATUS, METHOD OF STRIPPING A PHOTORESIST, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

摘要

Provided is a method of reducing resist residue on a semiconductor substrate surface in a step of performing resist stripping, by introducing ozone gas into a chemical solution. Circulation lines are arranged for a tank (12) for performing processing on the semiconductor substrate (1), and two circulation pumps (131, 132) and two filters (141, 142) are arranged on those circulation lines. Further, a gas introducing jig (34) configured to dissolve the ozone gas into the chemical solution is incorporated in those circulation lines.

主权项

1. A semiconductor-substrate processing apparatus configured to strip a photoresist on a semiconductor substrate, the semiconductor-substrate processing apparatus comprising:
a processing tank configured to hold a chemical solution; a first circulation path and a second circulation path, which are arranged in parallel to circulate the chemical solution inside the processing tank; and an ozone gas generating device configured to supply the processing tank with ozone gas.