| 摘要 |
Embodiments of present disclosure are directed to a bipolar plate assembly. The bipolar plate assembly has a frame and a base. At least one of the frame and the base has a shape of a force concentrator pattern or has a first surface having a force concentrator pattern, the force concentrator pattern including a raised surface extending partially across the first surface. A surface area of the force concentrator pattern across the length of the frame or base is generally constant, thereby producing a uniform compressive pressure along the length of the frame or base when the bipolar plate assembly is under compression. |
