发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 A nonvolatile semiconductor storage device a memory cell array including a plurality of memory cell units arranged in a matrix configuration, the memory cell units including a memory string including a series connection of a plurality of memory cells that stores data in accordance with a threshold voltage and is capable of electrical data writing and erasure, a first select gate transistor that connects a first end of the memory string to a bit line and a second select gate transistor that connects a second end of the memory string to a source line. The nonvolatile semiconductor storage device a discharge transistor that is connected between the bit line and the source line and causes discharge of the bit line to the source line.
申请公布号 US2017092362(A1) 申请公布日期 2017.03.30
申请号 US201615010775 申请日期 2016.01.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TAKEKIDA Hideto
分类号 G11C16/04;G11C16/34 主分类号 G11C16/04
代理机构 代理人
主权项 1. A nonvolatile semiconductor storage device, comprising: a memory cell array including a plurality of memory cell units arranged in a matrix configuration, the memory cell units including a memory string including a series connection of a plurality of memory cells that stores data in accordance with a threshold voltage and is capable of electrical data writing and erasure, a first select gate transistor that connects a first end of the memory string to a bit line and a second select gate transistor that connects a second end of the memory string to a source line; and a discharge transistor that is connected between the bit line and the source line and causes discharge of the bit line to the source line.
地址 Minato-ku JP