DEVELOPING METHOD, DEVELOPING APPARATUS AND STORAGE MEDIUM

摘要

A developing apparatus including a horizontal substrate holder, a rotating mechanism to rotate the substrate holder, a developer nozzle to supply a developer onto a part of the substrate to form a liquid puddle, a moving mechanism to move the developer nozzle in a radial direction of the rotating substrate, a contact part that moves with the developer nozzle and has a surface opposed to the substrate, which is smaller than the surface of the substrate, and a control unit to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate so that the liquid puddle is spread out on a whole surface of the substrate while the contact part is in contact with the liquid puddle.

主权项

1. A developing apparatus comprising:
a substrate holder configured to horizontally hold a substrate; a rotating mechanism configured to be rotated the substrate holder about a vertical axis; a developer nozzle configured to supply a developer onto a part of the substrate to form a liquid puddle; a moving mechanism configured to move the developer nozzle in a radial direction of the rotating substrate; a contact part configured to be moved together with the developer nozzle, the contact part having a surface opposed to the substrate, which is smaller than the surface of the substrate; and a control unit configured to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate, in order that the liquid puddle is spread out on a whole surface of the substrate, while the contact part is being in contact with the liquid puddle on the rotating substrate.