发明名称 |
FRAME WITH NON-UNIFORM GAS FLOW CLEARANCE FOR IMPROVED CLEANING |
摘要 |
The embodiments described herein generally relate to a frame for use in a plasma processing chamber to provide non-uniform gas flow flowing between the frame and sidewalls of the plasma processing chamber. In one embodiment, a frame includes a frame body having an inner wall and an outer wall defining a frame body, a center opening formed in the frame defined by the inner wall, and a corner region and a center region formed in a first side of the frame body. The corner region having a corner width that is smaller than a center width of the center region, wherein the widths are defined between the inner and outer walls. |
申请公布号 |
WO2017052855(A1) |
申请公布日期 |
2017.03.30 |
申请号 |
WO2016US47583 |
申请日期 |
2016.08.18 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KURITA, Shinichi;TINER, Robin L. |
分类号 |
H01L21/02;H01L21/205;H01L21/67;H01L21/683 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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