发明名称 PROCESSING LIQUID SUPPLY APPARATUS, OPERATING METHOD OF PROCESSING LIQUID SUPPLY APPARATUS, AND RECORDING MEDIUM
摘要 An electrode rod 71 serving as a first electrode is provided to be in contact with a flow path member and a processing liquid of a processing liquid supply path 2. If the processing liquid is flown in the processing liquid supply path 2, static electricity is generated by friction so that the processing liquid and the flow path member is electrically charged. By allowing the electrode rod 71 to be closely contacted with the flow path member, the amount of electric charges corresponding to the sum of the charge amounts of the processing liquid and the flow path member is measured as a surface potential of the first electrode by a surface potential measuring unit 77. The measured surface potential is displayed on a display unit 201.
申请公布号 US2017087575(A1) 申请公布日期 2017.03.30
申请号 US201615275588 申请日期 2016.09.26
申请人 Tokyo Electron Limited 发明人 Hashima Hitoshi
分类号 B05B12/08;G01N27/22;B05B12/00;B05B12/02;H01L21/67 主分类号 B05B12/08
代理机构 代理人
主权项 1. A processing liquid supply apparatus which supplies a processing liquid to a substrate from a nozzle, comprising: an insulating flow path member forming a processing liquid supply path through which the processing liquid is supplied to the nozzle; a first electrode configured to be in contact with the processing liquid of the processing liquid supply path; and a surface potential measuring unit configured to measure a surface potential of the first electrode.
地址 Tokyo JP