发明名称 |
BACKSCATTERED ELECTRONS (BSE) IMAGING USING MULTI-BEAM TOOLS |
摘要 |
Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target. |
申请公布号 |
WO2017053353(A1) |
申请公布日期 |
2017.03.30 |
申请号 |
WO2016US52766 |
申请日期 |
2016.09.21 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
MCCORD, Mark;SIMMONS, Richard;MASNAGHETTI, Douglas;KNIPPELMEYER, Rainer |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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