发明名称 BACKSIDE CONTACT STRUCTURES AND FABRICATION FOR METAL ON BOTH SIDES OF DEVICES
摘要 An apparatus including a circuit structure including a device stratum including a plurality of devices including a first side and an opposite second side; and a metal interconnect coupled to at least one of the plurality of devices from the second side of the device stratum. A method including forming a transistor device including a channel between a source region and a drain region and a gate electrode on the channel defining a first side of the device; and forming an interconnect to one of the source region and the drain region from a second side of the device.
申请公布号 WO2017052638(A1) 申请公布日期 2017.03.30
申请号 WO2015US52440 申请日期 2015.09.25
申请人 INTEL CORPORATION 发明人 MORROW, Patrick;MEHANDRU, Rishabh;LILAK, Aaron D.;JUN, Kimin
分类号 H01L29/78;H01L21/336;H01L27/12 主分类号 H01L29/78
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