发明名称 |
METHOD OF MANUFACTURING LARGE AREA GRAPHENE AND GRAPHENE-BASED PHOTONICS DEVICES |
摘要 |
The present invention relates to a method of manufacturing large area graphene for graphene-based photonics devices such as bolometric graphene detectors, or for use as a saturable absorber in ultra-high bandwidth detectors for producing ultrafast laser pulses. The method includes: growing a first graphene layer on one side of a metal substrate, and a second graphene layer on another side of the metal substrate; coating the first graphene layer with a plurality of resist layers including a low molecular weight polymethylmethacrylate, and a high molecular weight polymethylmethacrylate; removing the second graphene layer and the metal substrate to reveal the first graphene layer; disposing the first graphene layer on an optical substrate; and removing the plurality of resist layers from the first graphene layer to reveal a final graphene layer, which can be used as the basis to manufacture a multilayer graphene structure for graphene detectors. |
申请公布号 |
US2017088944(A1) |
申请公布日期 |
2017.03.30 |
申请号 |
US201514864442 |
申请日期 |
2015.09.24 |
申请人 |
U.S.A. represented by the Administrator of the National Aeronautics and Space Administration |
发明人 |
Sultana Mahmooda;Li Mary J.;Yu Anthony W. |
分类号 |
C23C16/26;C23F1/00;C01B31/04 |
主分类号 |
C23C16/26 |
代理机构 |
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代理人 |
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主权项 |
1. A method of preparing large area graphene, comprising:
growing a first graphene layer on one side of a metal substrate, and a second graphene layer on another side of said metal substrate; coating said first graphene layer with a plurality of resist layers; removing said second graphene layer and said metal substrate to reveal said first graphene layer; disposing said first graphene layer on an optical substrate; and removing said plurality of resist layers from said first graphene layer to reveal a final graphene layer. |
地址 |
Washington DC US |