DATA CORRECTION DEVICE, WRITING DEVICE, WIRING PATTERN FORMING SYSTEM, INSPECTION DEVICE, DATA CORRECTION METHOD, AND WIRING BOARD MANUFACTURING METHOD

摘要

Reference information is prepared for each of a plurality of mask gap widths (G), the reference information indicating the relationship between an upper surface gap width (GT) between upper surfaces of a pattern element pair (810) and a lower surface gap width (GB) between lower surfaces thereof, the pattern element pair (810) being formed on a film (8) on a board (9) by etching using a mask element pair (710), wherein the mask gap widths (G) are the widths between the individual mask elements in the mask element pair (710), said individual mask elements being formed adjacent to each other on the film (8). On a processed board that has been etched using a plurality of mask element pairs for which a plurality of mask gap widths have been set, a measured value of the upper surface gap width of each pattern element pair is acquired. By referring to reference information using the measured values, values of the lower surface gap widths at the plurality of mask gap widths are acquired, and film pattern design data are corrected on the basis of the values. In this way, correction of design data with reference to the lower surface of a film pattern can be easily implemented.