发明名称 |
TRANSISTOR COMPRISING FILL AREAS IN THE SOURCE AND/OR DRAIN REGION |
摘要 |
A transistor contains a source region and a drain region. Two or more fill areas are formed such that the fill areas and the source and/or drain region engage in one another. The fill areas have vertical dimensions which are at least of equal size to the vertical dimensions of the source and/or of the drain region. The fill areas and the source and/or drain region extend at least partially over a common vertical section. The fill areas are formed from an oxide and/or a nitride. |
申请公布号 |
EP1565943(B1) |
申请公布日期 |
2017.03.29 |
申请号 |
EP20030767457 |
申请日期 |
2003.11.26 |
申请人 |
Infineon Technologies AG |
发明人 |
ESMARK, Kai;RIESS, Philipp;SCHAFBAUER, Thomas;STREIBL, Martin;WENDEL, Martin |
分类号 |
H01L29/06;H01L29/08;H01L29/78 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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