发明名称 TRANSISTOR COMPRISING FILL AREAS IN THE SOURCE AND/OR DRAIN REGION
摘要 A transistor contains a source region and a drain region. Two or more fill areas are formed such that the fill areas and the source and/or drain region engage in one another. The fill areas have vertical dimensions which are at least of equal size to the vertical dimensions of the source and/or of the drain region. The fill areas and the source and/or drain region extend at least partially over a common vertical section. The fill areas are formed from an oxide and/or a nitride.
申请公布号 EP1565943(B1) 申请公布日期 2017.03.29
申请号 EP20030767457 申请日期 2003.11.26
申请人 Infineon Technologies AG 发明人 ESMARK, Kai;RIESS, Philipp;SCHAFBAUER, Thomas;STREIBL, Martin;WENDEL, Martin
分类号 H01L29/06;H01L29/08;H01L29/78 主分类号 H01L29/06
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