DEBRIS REMOVAL FROM A TRENCH FORMED ON A PHOTOLITHOGRAPHIC MASK

摘要

A method for removing debris from a trench formed on a photolithographic mask, comprising:
positioning a tip within the trench, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the photolithographic mask;
moving the tip within the trench to physically adhere debris to the tip;
moving the tip with the debris away from the trench; and removing the debris from the tip.