发明名称 Tunneling field-effect transistor including graphene channel
摘要 According to example embodiments, a tunneling field-effect transistor (TFET) includes a first electrode on a substrate, a semiconductor layer on a portion of the first electrode, a graphene channel on the semiconductor layer, a second electrode on the graphene channel, a gate insulating layer on the graphene channel, and a gate electrode on the gate insulating layer. The first electrode may include a portion that is adjacent to the first area of the substrate. The semiconductor layer may be between the graphene channel and the portion of the first electrode. The graphene channel may extend beyond an edge of at least one of the semiconductor layer and the portion of the first electrode to over the first area of the substrate.
申请公布号 EP2720273(B1) 申请公布日期 2017.03.29
申请号 EP20130186857 申请日期 2013.10.01
申请人 Samsung Electronics Co., Ltd 发明人 Heo, Jin-seong;Park, Seong-jun;Byun, Kyung-eun;Seo, David;Song, Hyun-jae;Lee, Jae-ho;Chung, Hyun-jong
分类号 H01L29/786;B82Y99/00;H01L29/08;H01L29/16;H01L29/739;H01L29/78 主分类号 H01L29/786
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