Lithographic apparatus and device manufacturing method

摘要

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

主权项

1. A lithographic apparatus configured to project an image of a desired pattern through a liquid onto a substrate, the apparatus comprising a moveable substrate table, there being a groove in a surface of the table or a gap between a structure of the table and a component when mounted on the table, with which the liquid can come into contact, the component comprising the substrate and/or a sensor system component, the gap or groove comprising a bottom surface having an opening configured to drain fluid from the gap or groove and the table comprising a fluid permeable member extending below the bottom surface to receive fluid drained by the opening.