发明名称 Method for fabrication of copper-indium gallium oxide and chalcogenide thin films
摘要 A composition of matter and method of forming copper indium gallium sulfide (CIGS), copper indium gallium selenide (CIGSe), or copper indium gallium telluride thin film via conversion of layer-by-layer (LbL) assembled Cu—In—Ga oxide (CIGO) nanoparticles and polyelectrolytes. CIGO nanoparticles are created via a flame-spray pyrolysis method using metal nitrate precursors, subsequently coated with polyallylamine (PAH), and dispersed in aqueous solution. Multilayer films are assembled by alternately dipping a substrate into a solution of either polydopamine (PDA) or polystyrenesulfonate (PSS) and then in the CIGO-PAH dispersion to fabricate films as thick as 1-2 microns. After LbL deposition, films are oxidized to remove polymer and sulfurized, selenized, or tellurinized to convert CIGO to CIGS, CIGSe, or copper indium gallium telluride.
申请公布号 US9608146(B2) 申请公布日期 2017.03.28
申请号 US201514682574 申请日期 2015.04.09
申请人 The United States of America, as represented by the Secretary of the Navy 发明人 Dressick Walter J.;Sanghera Jasbinder S.;Kim Woohong;Baker Colin C.;Myers Jason D.;Frantz Jesse A.
分类号 H01L31/032;H01L21/02 主分类号 H01L31/032
代理机构 US Naval Research Laboratory 代理人 US Naval Research Laboratory ;Forman Rebecca L.
主权项 1. A method of making copper indium gallium chalcogenide thin films, comprising: producing copper-indium-gallium oxide (CIGO) nanoparticles via flame spray pyrolysis; binding the CIGO nanoparticles to a polyamine and dispersing the polyamine-CIGO nanoparticles in an aqueous solution to form a polyamine-CIGO dispersion; making a polyanion solution; and dipping a substrate into the polyanion solution and then the polyamine-CIGO dispersion, wherein alternate dipping between the polyanion solution and the coated CIGO dispersion may be repeated multiple times to form a CIGO film.
地址 Washington DC US