发明名称 Nano-structure semiconductor light emitting device
摘要 A nano-structure semiconductor light emitting device includes a base layer formed of a first conductivity type semiconductor, and a first insulating layer disposed on the base layer and having a plurality of first openings exposing partial regions of the base layer. A plurality of nanocores is disposed in the exposed regions of the base layer and formed of the first conductivity-type semiconductor. An active layer is disposed on surfaces of the plurality of nanocores and positioned above the first insulating layer. A second insulating layer is disposed on the first insulating layer and has a plurality of second openings surrounding the plurality of nanocores and the active layer disposed on the surfaces of the plurality of nanocores. A second conductivity-type semiconductor layer is disposed on the surface of the active layer positioned to be above the second insulating layer.
申请公布号 US9608163(B2) 申请公布日期 2017.03.28
申请号 US201414165082 申请日期 2014.01.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Cha Nam Goo;Kuh Bong Jin;Choi Han Mei
分类号 H01L33/24;H01L33/08;H01L33/00;H01L33/18;H01L33/20;B82Y20/00 主分类号 H01L33/24
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A nano-structure semiconductor light emitting device comprising: a base layer formed of a first conductivity type semiconductor; a first insulating layer disposed on the base layer and having a plurality of first openings exposing partial regions of the base layer; a plurality of nano-light emitting structures, each comprising a nanocore disposed in the exposed regions of the base layer and formed of the first conductivity-type semiconductor and a shell including an active layer and a second conductivity-type semiconductor layer sequentially disposed on a surface of the nanocore; and a second insulating layer disposed on the first insulating layer and having a plurality of second openings surrounding the nanocore and the active layer, wherein the second openings have a diameter greater than that of the first openings, and a portion of the first insulating layer in a perimeter of the first openings is exposed by the second openings; wherein the active layer is entirely positioned above the exposed portion of first insulating layer and the second conductivity-type semiconductor layer is entirely positioned above the second insulating layer.
地址 Suwon-si, Gyeonggi-do KR