发明名称 Method for forming a mask pattern using a laser
摘要 A method of forming a pattern on a mask sheet using a laser beam includes determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet, determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet, applying a counter force to the mask sheet, fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet, scanning the laser beam along the correction scan line, and releasing the counter force which is applied to the mask sheet.
申请公布号 US9604314(B2) 申请公布日期 2017.03.28
申请号 US201414291833 申请日期 2014.05.30
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 Oh Yoon-Chan;Lee Choong-Ho
分类号 B23K26/38;G03F7/12;B23K26/362;B23K37/04;B23K26/10;H01L51/56;G03F7/20 主分类号 B23K26/38
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A method of forming a pattern on a mask sheet using a laser beam, the method comprising: determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet; determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet; applying a counter force to the mask sheet; fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet; scanning the laser beam along the correction scan line; and releasing the counter force which is applied to the mask sheet; the determining the correction scan line of the laser beam includes: applying a counter force to a preparatory mask sheet; fixing the preparatory mask sheet to a preparatory mask frame while the counter force is applied to the preparatory mask sheet; scanning the laser beam along the target scan line; releasing the counter force which is applied to the preparatory mask sheet; determining an actual scan line of the laser, in a status when the counter force which is applied to the preparatory mask sheet is released; determining an error between the target scan line and the actual scan line of the laser beam; and setting the correction scan line of the laser beam using the error.
地址 Gyeonggi-Do KR