发明名称 Incident illumination device for a microscope having a planar light source
摘要 The invention relates to an incident illumination device for a microscope, for viewing a sample (1) in the microscope (10), having a planar light source (100) for incident illumination of the sample (1), wherein the planar light source (100) comprises a panel-shaped light guide having a lower boundary surface (111), an upper boundary surface, and at least one lateral surface, as well as at least one light-emitting means that is arranged so that it irradiates light, via at least one lateral surface serving as a light entry surface, into the light guide in such a way that said light propagates in the light guide due to total reflection; wherein the total reflection is disrupted in defined fashion by an element abutting at the lower boundary surface of the light guide against a contact surface so that an outcoupling of light occurs at the upper boundary surface of the light guide.
申请公布号 US9606346(B2) 申请公布日期 2017.03.28
申请号 US201314418623 申请日期 2013.08.02
申请人 Leica Microsystems (Schweiz) AG 发明人 Paulus Robert;Schnitzler Harald;Züst Reto
分类号 G02B21/06;G02B21/08;F21V8/00 主分类号 G02B21/06
代理机构 Hodgson Russ LLP 代理人 Hodgson Russ LLP
主权项 1. An incident illumination device for a microscope, for viewing a sample (1) in the microscope (10), having a planar light source (100; 200; 300) for incident illumination of the sample (1), wherein the planar light source (100; 200; 300) comprises a panel-shaped light guide (110; 210; 310) having a lower boundary surface (111), an upper boundary surface (112), and at least one lateral surface (113 to 116), as well as at least one light-emitting means (120, 122) that is arranged so that it irradiates light (130), via at least one lateral surface serving as a light entry surface, into the light guide (110; 210; 310) in such a way that said light propagates in the light guide (110; 210; 310) due to total reflection; wherein the total reflection is disrupted in defined fashion by an element (140) abutting at the lower boundary surface (111) of the light guide (110; 210; 310) against a contact surface (A) so that an outcoupling of light occurs at the upper boundary surface (112) of the light guide (110; 210; 310).
地址 Heerbrugg CH