Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus

摘要

A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S′). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S′) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.

主权项

1. A mirror of a projection exposure apparatus for microlithography, comprising:
a substrate body having a first mirror surface and a second mirror surface, wherein
the first mirror surface is formed on a first side of the substrate body,the second mirror surface is formed on a second side of the substrate body, the second side being different from the first side of the substrate body,the first mirror surface and the second mirror surface are both embodied to reflect light directed for structured exposure onto a light-sensitive material and impinging onto the substrate body from outside the substrate body, andthe substrate body is produced from a glass ceramic material, and a further mirror surface forming an auxiliary surface.