Measuring apparatus, measuring method, lithography apparatus, and method of manufacturing article

摘要

The present invention provides a measuring apparatus for measuring a position of an alignment mark formed on a substrate and including a first mark having position information in a first direction and a second mark having position information in a second direction different from the first direction, the apparatus including a detector configured to detect an image of the alignment mark, a controller configured to control movement of a stage for holding the substrate and detection by the detector, and a processor configured to obtain a position of the alignment mark whose image is detected by the detector, wherein the controller is configured to cause the detector to detect the image of the alignment mark with the stage moving in the first direction, and cause the detector to detect the image of the alignment mark with the stage moving in the second direction.

主权项

1. A measuring apparatus for measuring a position of an alignment mark formed on a substrate and including a first mark having position information in a first direction and a second mark having position information in a second direction different from the first direction, the apparatus comprising:
a stage configured to hold the substrate and to be movable; a detector configured to detect an image of the alignment mark; a controller configured to control movement of the stage and detection by the detector; and a processor configured to obtain a position of the alignment mark whose image is detected by the detector, wherein the controller is configured to cause the detector to detect the image of the alignment mark with the stage moving in the first direction, and cause the detector to detect the image of the alignment mark with the stage moving in the second direction, the processor is configured to obtain a position of the second mark in the second direction based on an image of the second mark detected by the detector with the stage moving in the first direction, and obtain a position of the first mark in the first direction based on an image of the first mark detected by the detector with the stage moving in the second direction, the controller is configured to cause the detector to detect the image of the alignment mark with the stage stopped in a second period between a first period during which the stage is moved in the first direction and a third period during which the stage is moved in the second direction, and the processor is configured to obtain the position of the second mark in the second direction based on the image of the second mark detected by the detector in the first period and the second period, and obtain the position of the first mark in the first direction based on the image of the first mark detected by the detector in the second period and the third period.