Lithography apparatus, and method of manufacturing article

摘要

The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller configured to control a patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with a beam while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction, wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.

主权项

1. A lithography apparatus that performs patterning on a substrate with a beam, the apparatus comprising:
an optical system configured to irradiate the substrate with the beam; a plurality of detectors each configured to detect a mark on the substrate; and a controller configured to control the patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with the beam by the optical system while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction; wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.