Lithographic apparatus and method of manufacturing a device

摘要

There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

主权项

1. A lithographic apparatus comprising:
an illumination system configured to condition a radiation beam; a support structure configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a target portion of the substrate; and a filter adjacent the substrate table and configured to reduce or eliminate deep ultraviolet (DUV) radiation, wherein the filter at least partially closes an opening in the projection system, and wherein the filter comprises a membrane.