发明名称 |
Method of manufacturing semiconductor device |
摘要 |
Provided is a technique capable of uniformizing the characteristics of a film after a plurality of substrates are processed. A method of manufacturing a semiconductor device may include: (a) loading a substrate into a process chamber; (b) processing the substrate by performing: (b-1) supplying and exhausting a process gas into and from the process chamber without activating the process gas; (b-2) supplying and exhausting the process gas into and from the process chamber while activating the process gas; (b-3) measuring an amount of impurity desorbed from the substrate while performing (b-2); and (b-4) measuring a gas exhausted from the process chamber after performing (b-3); (c) calculating a process data based on: a first measurement data obtained by repeating (b-3); and a second measurement data obtained by repeating (b-4); and (d) determining whether to terminate (b) based on the process data. |
申请公布号 |
US9607908(B1) |
申请公布日期 |
2017.03.28 |
申请号 |
US201615273330 |
申请日期 |
2016.09.22 |
申请人 |
HITACHI KOKUSAI ELECTRIC, INC. |
发明人 |
Takeda Tsuyoshi |
分类号 |
H01L21/02;H01L21/66;H01L21/3065;H01L21/265 |
主分类号 |
H01L21/02 |
代理机构 |
Edell, Shapiro & Finnan, LLC |
代理人 |
Edell, Shapiro & Finnan, LLC |
主权项 |
1. A method of manufacturing a semiconductor device, comprising:
(a) loading a substrate into a process chamber; (b) processing the substrate by performing:
(b-1) supplying and exhausting a process gas into and from the process chamber without activating the process gas;(b-2) supplying and exhausting the process gas into and from the process chamber while activating the process gas;(b-3) measuring an amount of impurity desorbed from the substrate while performing (b-2); and(b-4) measuring a gas exhausted from the process chamber after performing (b-3); (c) calculating a process data based on: a first measurement data obtained by repeating (b-3); and a second measurement data obtained by repeating (b-4); and (d) determining whether to terminate (b) based on the process data. |
地址 |
Tokyo JP |