Method and apparatus for locally deforming an optical element for photolithography

摘要

The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form.

主权项

1. A method for locally deforming an optical element for photolithography in accordance with a predefined deformation form, the method comprising:
generating at least one laser pulse having at least one laser beam parameter, wherein the at least one laser beam parameter comprises a polarization of the at least one laser pulse; selecting the polarization of the at least one laser pulse to have a first polarization that is selected from a plurality of polarizations, each of the plurality of polarizations being associated with a predefined deformation form of the optical element; and directing the at least one laser pulse onto the optical element to locally deform the optical element in accordance with the predefined deformation form associated with the first polarization.