| 发明名称 | Illumination system for microlithography | ||
| 摘要 | A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements. | ||
| 申请公布号 | US9606441(B2) | 申请公布日期 | 2017.03.28 |
| 申请号 | US201615012087 | 申请日期 | 2016.02.01 |
| 申请人 | Carl Zeiss SMT GmbH | 发明人 | Scholz Axel;Schlesener Frank;Haverkamp Nils;Davydenko Vladimir;Gerhard Michael;Ziegler Gerhard-Wilhelm;Kern Mirco;Bischoff Thomas;Stammler Thomas;Kellner Stephan;Maul Manfred;Walldorf Daniel;Hurevich Igor;Deguenther Markus |
| 分类号 | G03B27/54;G03B27/42;G03F7/20 | 主分类号 | G03B27/54 |
| 代理机构 | Fish & Richardson P.C. | 代理人 | Fish & Richardson P.C. |
| 主权项 | 1. An illumination system configured to illuminate an object field with illumination light, the illumination system comprising: a first raster arrangement comprising a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system, the first plurality of bundle-forming raster elements configured to generate a raster arrangement of secondary light sources; a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field, the transmission optics comprising a second raster arrangement comprising a second plurality of bundle-forming raster elements; a displacement device configured to displace at least one displaceable segment of the first raster arrangement relative to the second raster arrangement, wherein: the at least one displaceable segment comprises exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements; andthe illumination system is a microlithography illumination system. | ||
| 地址 | Oberkochen DE | ||