发明名称 SEMI-METAL TUNNEL FIELD EFFECT TRANSISTOR
摘要 A tunnel field effect transistor (100) comprises a source region (102), a drain region (104), and a channel region (106) formed of a single material, in particular a half-metal. The channel extends between the source region and the drain region. The channel region (106) and the drain region (104) are smaller than a threshold size in a first dimension. The threshold size is the size required for the material to exhibit sufficient quantum confinement such that a non-zero band gap results and the material becomes a semiconductor. The source region (102) is larger than this threshold size in the first dimension and is thus metallic.
申请公布号 WO2017046024(A1) 申请公布日期 2017.03.23
申请号 WO2016EP71409 申请日期 2016.09.12
申请人 UNIVERSITY COLLEGE CORK 发明人 ANSARI, Lida;FAGAS, Giorgos;GREER, James
分类号 H01L29/739;B82Y10/00;H01L29/06;H01L29/16;H01L29/26 主分类号 H01L29/739
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