发明名称 SEMICONDUCTOR LAYER VARIATION FOR SUBSTRATE REMOVAL AFTER BONDING
摘要 A device for a gain medium for a semiconductor laser has an active region, a buffer layer, a substrate, and an etch stop between the buffer layer and the substrate. The device is bonded to a silicon platform having silicon devices, such as a waveguide and mirror. The substrate is removed, after bonding the device to the platform. The buffer layer is made of different material than the substrate to reduce undercut of the buffer layer during substrate removal compared to a buffer layer made of the same material as the substrate.
申请公布号 WO2017049277(A1) 申请公布日期 2017.03.23
申请号 WO2016US52453 申请日期 2016.09.19
申请人 SKORPIOS TECHNOLOGIES, INC. 发明人 SPANN, John Y.
分类号 H01L29/12;H01L21/768;H01L21/8238 主分类号 H01L29/12
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