SPACER AND MANUFACTURING APPARATUS THEREFOR

摘要

A spacer (4) and a manufacturing apparatus therefor. The apparatus comprises a photomask (10) and an exposure apparatus (20) directly facing the photomask (10), wherein the photomask (10) comprises a central light-transmissive region (10a) and a peripheral light-transmissive region (10b) arranged on the periphery of the central light-transmissive region (10a). Light rays emitted from the exposure apparatus (20) irradiate a negative photoresist material after penetrating through the photomask (10), and the intensity of light rays penetrating through the peripheral light-transmissive region (10b) is less than the intensity of light rays penetrating through the central light-transmissive region (10a). The manufacturing of an inverted T-shaped spacer (4) can be realized by means of a one-time exposure process, the process is simple, and the manufacturing cost of the spacer (4) is low. At the same time, the flatness of a convex shoulder portion of the inverted T-shaped spacer (4) manufactured by an apparatus for manufacturing the spacer (4) is adjustable, so that manufacturing requirements of spacers (4) of different specifications can be satisfied.