| 摘要 |
Provided is a method for manufacturing a mold for imprinting with which transfer failure is unlikely to occur. The present invention provides a method for manufacturing a mold for imprinting, the method being provided with: a winding step of winding a film mold having a resin layer on which a base pattern comprising an inverse pattern of a desired fine uneven pattern is formed, onto a column-shaped transfer roll so that a gap where the base pattern does not exist forms in a portion at which the two ends of the film mold abut one another; a resin filling step of filling the gap with a resin composition; and a pattern forming step of pressing a transfer pattern provided on a pattern adding mold onto the resin composition to form an additional pattern, including an inverse pattern of the transfer pattern, on the resin composition, wherein the filling with the resin composition is performed in such a way that the resin composition protrudes from the gap to form a protruding part thereof on a surface of the resin layer before or when the pattern adding mold is pressed onto the resin composition. |
