发明名称 METHOD OF MANUFACTURING BONDED SUBSTRATE, BONDED SUBSTRATE, METHOD OF MANUFACTURING SOLID-STATE IMAGING APPARATUS, SOLID-STATE IMAGING APPARATUS, AND CAMERA
摘要 Disclosed herein is a method of manufacturing a bonded substrate, including the steps of: forming a first bonding layer on a surface on one side of a semiconductor substrate; forming a second bonding layer on a surface on one side of a support substrate; adhering the first bonding layer and the second bonding layer to each other; a heat treatment for bonding the first bonding layer and the second bonding layer to each other; and thinning the semiconductor substrate from a surface on the other side of the semiconductor substrate to form a semiconductor layer.
申请公布号 US2017084647(A1) 申请公布日期 2017.03.23
申请号 US201615368284 申请日期 2016.12.02
申请人 Sony Corporation 发明人 Fujii Nobutoshi
分类号 H01L27/146;H04N5/374 主分类号 H01L27/146
代理机构 代理人
主权项
地址 Tokyo JP