| 发明名称 |
ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM |
| 摘要 |
For controlling an intensity distribution of an illumination radiation impinging on an object field, an illumination apparatus for a projection exposure apparatus for microlithography includes a mechanism for spatially displacing an illumination beam relative to a first facet mirror of an illumination optical unit. |
| 申请公布号 |
US2017082929(A1) |
申请公布日期 |
2017.03.23 |
| 申请号 |
US201615368942 |
申请日期 |
2016.12.05 |
| 申请人 |
Carl Zeiss SMT GmbH |
发明人 |
Patra Michael;Deguenther Markus |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus, comprising:
an output coupling optical unit configured to generate a plurality of individual output beams from a common collective output beam; at least two illumination optical units configured to transfer illumination radiation in different individual output beams into separate object fields; and a device configured to influence at least one of the individual output beams guided to the illumination optical units, wherein the device has a regulation bandwidth of at least 1 kHz, and the apparatus is a microlithography illumination apparatus. |
| 地址 |
Oberkochen DE |
