GAS BARRIER FILM AND THERMAL INSULATION PANEL

摘要

This gas barrier film comprises a transparent plastic film substrate, a ceramic vapor-deposition layer formed from AlO x and provided in sequence to the first surface of the transparent plastic film substrate, and a metal vapor-deposition layer, wherein the aforementioned x falls within the range of 1.5 to 1.7, and the thickness of the metal vapor-deposition layer falls within the range of 5 nm to 60 nm.